Pellicle Dust Proof Membrane

Pellicle Dust Proof Membrane Mitsui Pellicle is a dust proof membrane applied to photomask in the lithography process of the semiconductor manufacturing process. Pellicle's membrane materials and membrane thickness are designed to optimize different light exposures and achieve excellent transmission rates. To ensure photomask, Mitsui Chemicals selects materials such as non-dust structures, that eliminate particle generation and ensure cleanliness during long periods of light exposure.